摘要
在半导体工业，传统光刻技术早已成为制作大规模集成电路的支柱，由于光刻设备极其昂贵，并且传统光刻技术已经逐渐达到其分辨率极限，因此研究其他能够替代传统光刻技术的半导体加工技术具有极大的现实意义。毛细力光刻技术作为一种新型的非传统光刻技术已经发展了十多年的时间，与传统光刻技术相比，毛细力光刻技术具有其他的一些优点：1)它不需要依赖昂贵的制作设备；2)它具有很高的分辨率；3)它的制作工艺简单、制作周期短；4)模板可重复利用，可以大幅度降低制作成本；5)能够用于大面积大尺寸纳米结构制作。然而到目前为止，国内外关于毛细力光刻技术的研究多集中在平面上，鲜有将之应用于曲面上微纳加工的研究报道。此外，关于该技术的研究大多集中于实验方面，而在仿真方面工作较少，并且只局限于粗略的定性分析，而没有实现真正意义上严格的数值仿真。针对以上研究现状，本文对毛细力光刻技术在曲面上的微纳加工以及平面上的大面积加工进行了深入的研究；同时采用严格的有限元数值模拟方法，对毛细力光刻技术的动态物理过程进行仿真，获得了与实验结果基本一致的结果。本论文的研究工作具体如下：
实验方面：1)研究了三维曲面上的毛细力光刻技术，利用此技术制作了微米同心圆环结构和纳米衍射光栅结构，所获得的样品台阶高度分别达到了母板台阶高度的65%和83%；2)研究了去润湿辅助的毛细力光刻技术，我们发现利用此技术可以制作出周期性结构尺寸减半的纳米光栅样品，文中使用周期为430nm的光栅母板制作出了周期为215nm的光栅样品；3）研究了利用毛细力光刻技术制作亚波长抗反射结构的工艺过程，并利用软光刻技术在光学元件表面制作了sol-gel材料抗反射结构，所制作的抗反射结构使光学元件表面的反射率在可见光波长范围内降低了1%左右。
理论方面：利用COMSOL Multiphysics仿真软件建立了封闭毛细管中毛细上升现象的仿真模型。系统地研究了模型中接触角、毛细管直径以及通道内部压强对毛细管中气液界面上升高度的影响。通过比较毛细力光刻仿真和实验结果，我们发现该模型能够精确地预测毛细力光刻技术的作用过程，从而使毛细力光刻技术的研究工作变得更加容易。
目前，关于毛细力光刻技术的研究工作尚不成熟，为了能够让此技术应用于实际的工业生产中，仍需要开展大量的研究工作。本文的研究内容将有助于后来的研究人员快速地掌握这一新技术。
Traditional photolithography has been the dominant technology to manufacturethe large-scale integrated circuit in semiconductor industry. However, traditionalphotolithography requires the very expensive equipment from one hand and isgradually approaching its resolution limit from the other hand so that it is alwaysinteresting to develop new lithographic technologies to replace the traditionalphotolithography. Capillary force lithography as an alternative lithographictechnology is a novel non-traditional lithography technology and has been developedfor more than one decade. Capillary force lithography has a few advantages over thetraditional photolithography technology:1) it doesn’t need expensive equipment;2)it has a very high resolution;3) the fabrication process is simple and short;4) themold is reusable so that the fabrication cost is significantly saved;5) it can beadapted for large-scale nanofabrication in larger area. Up to now, the most reportedworks on capillary force lithography are implemented on the plane surfaces ratherthan the curved surfaces. Moreover, the most reported researches are focusing on theexperiments. There is nearly no work is reported on the rigorous numericalsimulation of the process but just some work on the rough qualitative analysis whichcan not predict the fabrication process precisely. In view of the above research situation, this thesis carries on a deep research on the micro-and nano-fabricationon the curved surfaces in large area by using the capillary force lithography. At thesame time, a rigorous finite element simulation method was employed to simulatethe dynamic physical process of capillary force lithography. The main work down inthis thesis includes:
In experiment:1) Capillary force lithography on3D curved surfaces wasresearched. Micro and nanogratings with concentric circular structures on3D curvedsurfaces were successfully fabricated by employing this technology. The heights ofthe fabricated structures obtained in our experiments have reached65%and83%ofthe masters for micro and nanostructures respectively;2) Dewetting assistedcapillary force lithography was found and developed. We found that the resolution ofthe capillary force lithography can be enhanced for two folds by this technology. Inthe thesis, a period of215nm grating was obtained by using the master gratingwhose period is430nm;3) The process of fabricating sub-wavelength antireflectionstructures by capillary force lithography was developed. The sol-gel antireflectionstructures were fabricated on the surface of optical elements by soft lithography. Thefabricated antireflection structures can effectively reduce the the reflectance ofoptical elements surface by about1%in the range of visible light.
In theory: A simulation model of capillary rise phenomenon in the closedcapillary tube was built by utilizing the COMSOL Multiphysics simulation software.How the contact angle, the diameter of capillary tube and the inner pressure of thetube affect the height of the gas/liquid interface was studied systematically. Incomparison with the experimental results, the model is found to be able to predictthe dynamic fabrication process precisely. This will make the study on capillaryforce lithography easier.
At present, the capillary force lithography is still immature and extensive workneeds to be done to make the technology more practical for industry. The work downin this thesis can be helpful for those following researchers to catch up with this newtechnology.
引文
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